MDA-400M-6
- Type: PC/PLC Control Manual (Mask Aligner)
- Mask Size: Up to 7″ x 7″
- Substrate Size: piece to 6″
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- UV Lamp & Power: 350W & Power Supply
- Uniform Beam Size: 6.25″ x 6.25″
- Beam Uniformity: <±5%
- Beam Wavelength: 350~450nm
- 365nm intensity:~25mW/cm2
- Alignment Accuracy: 1um
- Process resolution: 1um@1um PR thickness with vacuum contact
- Process mode: Soft, Hard, Vacuum contact & Proximity
- Substrate chuck movement: x,y,z & ?
- Other Accessories: Anti vibration table, IR BSA
- Option available: UV Intensity meter, UV-LED (365nm) exposure module
MDA-60MS
- Type: Manual (PC Control)
- Mask Size: Up to 7″ x 7″
- Substrate Size: piece to 6″x6″
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- UV Lamp & Power: 1kW & Power Supply
- Uniform Beam Size: 7.25″ x 7.25″
- Beam Uniformity: <±5%
- Beam Wavelength: 350~450nm
- 365nm intensity:~25mW/cm2
- Alignment Accuracy: 1um
- Process resolution: 1um@1um PR thickness with vacuum contact
- Process mode: Soft, Hard, Vacuum contact & Proximity
- Substrate chuck movement: x,y(Manual), z, ? (Motorized)
- Option available: CCD BSA, UV Intensity meter, Anti Vibration Table
MDA-400M
- Type: Fully Manual (Mask Aligner)
- Mask Size: Up to 5″ x 5″
- Substrate Size: piece to 4″ dia
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- UV Lamp & Power: 350W & Power Supply
- Uniform Beam Size: 4.25″ x 4.25″
- Beam Uniformity: <±3%
- Beam Wavelength: 350~450nm
- 365nm intensity: 20~30mW/cm2
- Alignment Accuracy: 1um
- Process resolution: 1um@1um PR thickness with vacuum contact
- Process mode: Soft, Hard, Vacuum contact & Proximity
- Substrate chuck movement: x,y,z & ?
- Option available: Anti vibration table, UV Intensity meter,
MDA-400LJ
- Type: Fully Manual (Mask Aligner)
- Mask Size: Up to 5″ x 5″
- Substrate Size: piece to 4″ dia
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- UV Lamp & Power: UV LED & Power Supply
- Uniform Beam Size: 125mm dia”
- Beam Uniformity: <±3%
- Beam Wavelength: 365nm
- 365nm intensity:~20mW/cm2
- Alignment Accuracy: 1um
- Process resolution: 1um@1um PR thickness with vacuum contact
- Process mode: Soft, Hard, Vacuum contact & Proximity
- Substrate chuck movement: x,y,z & ?
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