BOE is a wet etchant that is commonly used in microfabrication. Its major application is in the etching of thin silicon dioxide (SiO2) or silicon nitride coatings (Si3N4). It’s a combination of a buffering agent like ammonium fluoride (NH4F) and hydrofluoric acid (HF). Concentrated HF etches silicon dioxide too rapidly for excellent process control and also removes lithographic patterning photoresist.

BOE may be used to remove the oxide from AlGaN/GaN-based high electron mobility transistors for gate photolithography. It can be utilised in a buffer oxide etchant process to make tiny biochips.

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