Exposure: Photolitography
Another important aspect of photoresist exposure is the standing wave effect. Monochromatic light, when projected onto a wafer, strikes the photoresist surface over a range of angles, approximating plane waves… read more
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International conference on NANOTECHNOLOGY Research and Commersialisation (ICONT 2011)
Date: 06th– 09th June 2011
Location: Grand Borneo Hotel, Sabah, Malaysia
Another important aspect of photoresist exposure is the standing wave effect. Monochromatic light, when projected onto a wafer, strikes the photoresist surface over a range of angles, approximating plane waves… read more
Contact and proximity lithography are the simplest methods of exposing a photoresist through a master pattern called a photomask (Figure above). Contact lithography offers high resolution (down to about the.. read more
The fabrication of an integrated circuit (IC) requires a variety of physical and chemical processes performed on a semiconductor (e.g., silicon) substrate. In general, the various processes used to make.. read more